Semiconductor device and manufacture method thereof, as well as light emitting semiconductor device

ABSTRACT

A semiconductor device such as a light emitting semiconductor device comprising a mask layer having opening areas and a selective growing layer comprising a semiconductor grown selectively by way of the mask layer, with each of the mask layer and the selective growing layer being disposed by two or more layers alternately. The semiconductor device is manufactured by a step of laminating on a substrate a mask layer having opening areas and a selective growing layer comprising a semiconductor grown selectively way of a mask layer, each by two or more layers alternately and a subsequent step of laminating semiconductor layers thereon. Threading dislocations in the underlying layer are interrupted by the first mask layer and the second mask layer and do not propagate to the semiconductor layer. The density of the threading dislocations is lowered over the entire surface and the layer thickness can be reduced.

RELATED APPLICATION DATA

This application is a divisional of U.S. application Ser. No. 09/176,270filed Oct. 21, 1998, now U.S. Pat. No. 6,111,277. The present andforegoing applications claim priority to Japanese application No.P09-293036 filed Oct. 24, 1997. All of the foregoing applications areincorporated herein by reference to the extent permitted by law.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention concerns a semiconductor device comprising, forexample, a group III nitride compound semiconductor and a method ofmanufacturing thereof, as well as a light emitting semiconductor device.

2. Description of the Related Art

In recent years, vigorous development has been conducted for lightemitting semiconductor devices such as semiconductor lasers or lightemitting diodes (LED) capable of emitting light in a range from avisible region to a UV-region by using Group III nitride compoundsemiconductors such as AlGaInN. Particularly, in the field of lightrecording, it has been demanded for attain practical use of asemiconductor laser capable of obtaining a light in a short wavelengthregion in order to improve the recording density, for example, of anoptical disc.

Recently, in AlGaInN system semiconductor lasers, continuous oscillationfor 300 hours at a room temperature has been attained by growing a layercomprising a Group III nitride compound semiconductor by way of a bufferlayer on a substrate made of sapphire by means of a metal organicchemical vapor deposition (MOCVD) method (Jpn. J. Appl. Phys. 35, L74(1996); and 36 L1059 (1997)). However, in view of the progress curve ofa driving current during use, moderate increase is observed from theinitial stage of voltage supply and it can be seen that degradationproceeds gradually. As the cause for the degradation, it is consideredthat the layer comprising the Group III nitride compound semiconductorformed on a substrate contains threading dislocations (dislocations inwhich dislocation defects are propagated and penetrate crystals) ofabout 1×10⁸-1×10⁹N/cm². Accordingly, it is necessary to reduce thedensity of threading dislocations in order to attain a practical workinglife of 10,000 hours or more, for which various studies have been made.

For example, one of such counter measures include, for example, a methodof forming a GaN layer by way of a buffer layer on a sapphire substrate,laminating thereon a mask layer in which mask areas comprising silicondioxide (SiO₂) strips each of 1 to 4 μm with at a pitch of 7 μm and thenselectively growing a GaN layer laterally by a halide vapor depositionlayer on the mask layer (Jpn. J. Appl. Phys, 36 L899 (1997)). Accordingto this method, the density of the threading dislocations in the GaNlayer formed on the mask layer can be reduced to about 1×10⁷N/cm²,

In this method, however, unevenness is liable to be caused on thesurface of the GaN layer formed on the mask layer and it is difficult toobtain a planar surface. This is because, the GaN layer at firstproceeds in the opening areas of the mask layer (that is, between eachof the mask areas) to form a protuberance and then proceeds to a portionabove the mask areas (that is, in the lateral direction) in the courseof growing. Accordingly, in order to make the surface planar, it isnecessary to increase the thickness of the GaN layer to at least 10 μmor more. Accordingly, this requires a long time for growing and resultsin various problems that defects or warps are formed due to disagreementof the lattice constant relative to the substrate made of sapphire.

Further, although propagation of the threading dislocation can besuppressed by selective growing in the lateral direction above the maskarea, the threading dislocation from the GaN layer below the mask layeris continued as it is in the opening areas. Therefore, while the densityof the threading dislocations is reduced in the regions above the maskareas, the density of the threading dislocations is maintained above theopening areas and, thus, the density can not be reduced as a whole.Accordingly, a light emitting region has to be formed exactly in theregions above the mask areas, which results in a problem that the degreeof freedom in the manufacture is small, the manufacturing steps arecomplicated and manufacture is made difficult.

For the technique of selectively growing the GaN layer on the masklayer, a MOCVD method has also been reported in addition to the halidevapor deposition method (J. Crtst. Growth 144 133 1994)). However, thisis not a report aiming at the selective growing on the mask layer.Further, a report examining the anisotropy upon selective growing on themask layer by the MOCVD method has been made recently. According to thisreport, when a GaN layer is formed by way of a buffer layer on asubstrate made of sapphire and a GaN layer is formed thereover by way ofa mask layer in which a plurality of strip-like mask areas are formed in<11-20> direction, lateral growing is accelerated and growing ofprotuberance in the opening areas is suppressed to obtain a relativelyplanar grown surface closer to a C face under certain conditions (Appln.Phys. Lett 71 1204 (1997)). However, the report does not mention to thedislocation density but only shows the possibility of satisfactorycrystal growing in the lateral direction.

The <11-20> direction mentioned herein should, exactly, be expressed byattaching an overline above a numerical figure as shown below but thisis indicated herein by attaching “−” before the numerical figure(hereinafter, this convenient indication is used for such expression).

<1120>

SUMMARY OF THE INVENTION

The present invention has been accomplished in view of the foregoingproblems and an object thereof is to provide a semiconductor devicecapable of lowering the density of threading dislocations over theentire surface and capable of reducing the layer thickness, and a methodof manufacturing thereof, as well as a light emitting semiconductordevice.

A semiconductor device according to the present invention comprises amask layer in which opening areas are formed and a selective growinglayer comprising a semiconductor which is grown selectively by way ofthe mask layer, with the mask layer and the selective growing layerbeing disposed each by two or more layers alternately.

A method of manufacturing a semiconductor device according to thepresent invention comprises:

a step of laminating on a substrate a mask layer having opening areasand a selective growing layer comprising a semiconductor which is grownselectively way of a mask layer, with the mask layer and the selectivegrowing layer being disposed each by two or more layers alternately; and

a step of laminating the mask layer and the selective growing layer eachby two or more layers and then laminating semiconductor layers thereon.

In a light emitting semiconductor device according to the presentinvention, a first conduction type cladding layer, an active layer and asecond conduction type cladding layer each comprising a semiconductorare at least laminated successively on a substrate, in which a masklayer has opening areas formed therein and a selective growing layercomprising a semiconductor grown selectively by way of the mask layerare laminated each by two or more layers alternately between thesubstrate and the first conduction type cladding layer.

In the semiconductor device according to the present invention, sincethe mask layer and the selective growing layer are disposed each by twoore more layers, propagation of threading dislocations in the laminatingdirection is interrupted and the density of the threading dislocationsis lowered.

In the method of manufacturing the semiconductor device according to thepresent invention, since the mask layer and the selective growing layerare laminated each by two or more layers alternately, propagation of thethreading dislocations in the laminating direction is interrupted. Then,semiconductor layers are laminated on them.

In a light emitting semiconductor device according to the presentinvention, when a voltage is applied between the first conduction typecladding layer and the second conduction type cladding layer, current isinjected to an active layer to cause light emission. Since the masklayer and the selective growing layer are disposed each by two or morelayers alternately between the substrate and the first conduction typecladding layer, propagation of the threading dislocations in thelaminating direction is interrupted and the density of the threadingdislocations in the first conduction type cladding layer, the activelayer and the second conduction type cladding layer is reduced.

DESCRIPTION OF THE ACCOMPANYING DRAWINGS

FIG. 1 is a cross sectional view illustrating a constitution of a lightemitting semiconductor device in a first embodiment according to thepresent invention;

FIG. 2 is a cross sectional views illustrating a portion of the lightemitting semiconductor device shown in FIG. 1 in an enlarged scale;

FIGS. 3A to 3C are cross sectional views illustrating steps ofmanufacturing the light emitting semiconductor device shown in FIG. 1;

FIGS. 4A to 4C are cross sectional views illustrating other steps ofmanufacturing the light emitting semiconductor device shown in FIG. 1;and

FIG. 5 is a cross sectional view illustrating a constitution of a lightemitting semiconductor device in a second embodiment according to thepresent invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

Preferred embodiments of the present invention will be explained withreference to the drawings.

FIG. 1 illustrates a light emitting semiconductor device of a firstpreferred embodiment according to the present invention. FIG. 2illustrates a portion of the light emitting semiconductor device shownin FIG. 1 in an enlarged scale. In the light emitting semiconductordevice, for example, an underlying layer 3 comprising GaN of 2 μmthickness is laminated by way of a buffer layer 2 comprising GaN of 30nm thickness in the laminating direction (hereinafter simply referred toas thickness) on a C face of a substrate 1 comprising sapphire. Thebuffer layer 2 comprises a crystal layer approximate to an amorphousstate grown at a low temperature, which constitutes nuclei upon growingof the underlying layer 3. The underlying 3 comprises crystals and hasabout 1-10⁸ to 1×10⁹N/cm² of threading dislocations M extending in thelaminating direction as shown by fine lines in FIG. 2. The surface ofthe underlying layer 3 is made substantially planar.

On the underlying layer 3, are laminated alternately two or more layersof mask layers in each of which a plurality of opening areas 4 c aredisposed respectively (first mask layer 4 a and a second mask layer 4 bin this embodiment), and two or more layers of selective growing layers(first selective growing layer 5 a and a second selective growing layer5 b in this embodiment) grown selectively by way of each of the masklayers 4 a, 4 b respectively. They are arranged in order to interruptthe threading dislocations M from propagating in the laminatingdirection from the underlying layer 3 by selectively growing each of theselective growing layers 5 a, 5 b in the lateral direction (directionperpendicular to the laminating direction) respectively on each of themask layers 4 a, 4 b (refer to FIG. 2).

This lowers the density of the threading dislocations M in the selectivegrowing layer at the uppermost layer (second selective growing layer 5 bin this embodiment) to about 1×10³N/cm² or less compared with that inthe underlying layer 3. Explanation will be made concretely to a case inwhich two mask layers (first mask layer 4 a and second mask layer 4 b)are formed.

The first mask layer 4 a and the second mask layer 4 b have, forexample, from 100 to 200 nm thickness and are constituted withdielectric material such as silicon dioxide, silicon nitride (Si₃N₄) oraluminum oxide (Al₂O₃) respectively. Each of the first mask layer 4 aand the second mask layer 4 b has, for example, a plurality ofstrip-like mask areas 4 d extended in <11-20> direction (directionperpendicular to the drawing in FIG. 1), respectively (namely, having aplurality of strip-like opening areas 4 c extended in the <11-20>direction between each of the mask areas 4 d). In each of the first masklayer 4 a and the second mask layer 4 b, a width (mask width) L1 for themask areas 4 d is, for example, 1.5-4 μm and a pitch width L2 is, forexample, of 3 to 6 μm. The mask width L1 and the pitch width L2 areidentical between the first mask layer 4 a and the second mask layer 4b, respectively.

However, the positions for forming the opening areas 4 c are differentbetween the first mask layer 4 a and the second mask layer 4 b, suchthat the opening areas 4 c of the first mask layer 4 a are completelycovered with the mask areas 4 d of the second mask 4 b as viewed in thelaminating direction. They are so arranged to interrupt the threadingdislocations M continued from the underlying layer 3 thorough theopening areas 4 c of the first mask 4 d by the second mask layer 4 d(refer to FIG. 2). Accordingly, it is preferred that the mask width L1in the first mask layer 4 a and the second mask layer 4 b is larger thanthe width L3 of the opening areas 4 c (opening width). This is definedso as to effectively interrupt the threading dislocations M. The openingwidth L3 is as shown by an arrow in FIG. 2.

The first selective growing layer 5 a and the second selective growinglayer 5 b are constituted, for example, with GaN respectively and thethickness for the sum of them is relatively thin as 10 μm or less (forexample, about 7 to 8 μm). This is because the surface can be planarizedwith no thick lamination, by laminating the first mask layer 4 a and thesecond mask layer 4 b having different positions for forming the openingareas 4 c, since a concave portion for the first selective growing layer5 a formed by selective growing can be grown preferentially by thesecond selective growing layer 5 b.

The thickness of the first selective growing layer 5 a is preferably asthin as possible and it is sufficient that the mask portion 4 d of thefirst mask layer 4 a is covered completely by the selective growing inthe lateral direction.

That is, it may be in such a state in which the surface is not planar,such that a region situated above the opening area 4 c is protruded,while a region situated above the mask areas 4 d is concaved. This isbecause growing requires much time if the thickness is increased, toresult in a problem such as occurrence of defects and warps caused bymismatching of lattice constant and thermal expansion coefficientrelative to the substrate 1 made of sapphire. Further, the thickness ofthe second selective growing layer 5 b is preferably such that it issufficient to make the surface planar, so that a satisfactorysemiconductor layer can be grown on the layer 5 b.

On the second selective growing layer 5 b, are laminated successively ann side contact layer 6 as a semiconductor layer, an n type claddinglayer 7 as a first conduction type cladding layer, a first guiding layer8, an active layer 9, a degradation preventive layer 10, a secondguiding layer 11, a p type cladding layer 12 as a second conduction typecladding layer and a p type contact layer 13.

The n side contact layer 6 has, for example, 2 μm thickness and isconstituted with n type GaN with addition of silicon (Si) as an n typeimpurity. The n type cladding layer 7 has, for example, 0.5 μm thicknessand is constituted with n type AlGaN mixed crystals with addition ofsilicon as an n type impurity. The first guiding layer 8 has, forexample, 0.1 μm thickness and is constituted with n type GaN withaddition of silicon (Si) as an n type impurity. The active layer 9 isconstituted, for example, with GaInN mixed crystals having a multiplequantum well structure having a well thickness of 3 nm and a barrierlayer thickness of 4 nm.

The degradation preventive layer 10 or blocking layer against currentoverflow is constituted, for example, with AlGaN having 20 nm thickness.The second guiding layer 11 has, for example, 0.1 μm thickness and isconstituted with p type GaN with addition of magnesium (Mg) as a p typeimpurity. The p type cladding layer 12 is constituted with AlGaN mixedcrystals and having, for example, 0.5 μm thickness with addition ofmagnesium as p type impurity. The p side contact layer 13 has, forexample, 0.5 μm thickness and is constituted with p type GaN mixedcrystals with addition of magnesium as a p type impurity.

On the p side contact layer 13, are formed an insulation layer 14comprising an insulation material such as silicon dioxide and a p sideelectrode 15 formed by way of an opening 14 a disposed to the insulationlayer 14. The p side electrode 15 comprises a constitution in whichnickel (Ni) and gold (Au) are laminated successively from the side ofthe p-side contact layer 13. The p side electrode 15 is formed into anarrow strip-like shape (a strip-like shape extended in the directionvertical to the drawing in FIG. 1) in order to restrict current.Further, an n side electrode 16 is disposed on the n side contact layer6, the electrode 16 comprising titanium (Ti), aluminum (Al) and gold(Au) laminated successively from the side of the n side contact layer 6.

Further, in the light emitting semiconductor device, reflection mirrorlayers are disposed respectively on a pair of lateral surfaces verticalto the longitudinal direction of the p side electrode 15 (that is, inthe longitudinal direction of a resonator) although not illustrated.

A light emitting semiconductor device having thus been constituted canbe manufactured as described below. FIG. 3 illustrates a portion ofsteps in a manufacturing method.

In the manufacturing method, a substrate 1 is at first provided and, abuffer layer 2 comprising GaN is formed on the C face, for example, by aMOCVD method. In this case, the temperature for the substrate 1 is setat 520° C. and trimethyl gallium gas ((CH₃)₃Ga) and ammonia gas (NH₃)are used as the starting material gas, for example. Then, an underlyinglayer 3 comprising GaN is formed on a buffer layer 2 in the same manner,for example, by a MOCVD method. However, the temperature of thesubstrate 1 is set at 1020° C. In the underlying layer 3, threadingdislocations M at high concentration are present as shown by fine linesin FIG. 3A.

Successively, a first mask layer 4 a comprising SiO₂ is formed on theunderlying layer 3, for example, by a CVD (Chemical Vapor Deposition)method while setting the temperature of the substrate 1 to 450° C.Subsequently, a resist film not illustrated is coated and a plurality ofparallel strip-like mask patterns are formed by photolithography, andetching is conducted using the pattern as a mask to selectivelyeliminate the first mask layer 4 a thereby forming a plurality ofstrip-like mask areas 4 d and a plurality of opening areas 4 c extendedin the <11-20> direction respectively.

After forming the first mask layer 4 a, it is washed withacetone(CH₃COOCH₃) and methanol (CH₃OH) and, further, immersed in adiluted hydrochloric acid (HCl) or diluted hydrofluoric acid (HF) forabout 10 sec and then cleaned with purified water.

Subsequently, a first selective growing layer 5 a comprising GaN isselectively grown in a lateral direction on the first mask layer 4 a,for example, by a halide vapor deposition method. The halide vapordeposition method means vapor deposition method in which halogencontributes to transportation or reaction (the halide vapor depositionmethod is also refereed to as a hydride vapor deposition method). Inthis case, the temperature of the substrate is set to 1000° C. andammonia, metal gallium and hydrochloric acid are used as the startingmaterial for instance. Specifically, after heating the substrate 1 to1000° C. while flowing an ammonia gas at a flowrate of 2 liter/min, agaseous hydrochloric acid is caused to flow on metallic gallium and agallium chloride (GaCl) gas is supplied. The condition for supplying theGaCl gas is such that the flowing rate is about 20 μm/hr.

Then, when conducting growing, for example, for 9 min, a first selectivegrowing layer 5 a in the form of protuberances each surrounded with the(1-101) face is formed above the opening areas 4 c of the first masklayer 4 a as shown in FIG. 3A. Then, in the first selective growinglayer 5 a, since the threading dislocations M from the underlying 3 arecontinued along the direction of the C axis (namely laminatingdirection) in the regions situating above the opening areas 4 c of thefirst mask layer 4 a, threading dislocations M are formed like that inthe underlying layer 3. On the other hand, in the first selectivegrowing layer 5 a, since growing takes place in the lateral direction inthe region situating above the mask areas 4 d of the first selectivegrowing layer 5 a, threading dislocations M from the underlying layer 3do not propagate and no threading dislocations M are formed. The growingtime for the first selective growing layer 5 a is preferably such thatthe first selective growing layer 5 a is selectively grown in thelateral direction, completely covers the region above the mask areas 4 dand further grows a little.

After forming the first selective layer 5 a, as illustrated in FIG. 3B,a second mask layer 4 b is formed thereover like that the first masklayer 4 a, and a plurality of mask areas 4 d and a plurality of openingareas 4 c are formed respectively. However, in the second mask layer 4b, the opening areas 4 c are formed at positions different from those inthe first mask layer 4 a, such that the opening areas 4 c of the firstmask layer 4 a are completely covered with the mask areas 4 d of thesecond mask layer 4 b as viewed in the laminating direction. That is,the mask areas 4 d of the second mask layer 4 b are situated above theopening areas 4 c of the first mask layer 4 a, while the opening areas 4c of the second mask layer 4 b are situated on the mask areas 4 d of thefirst mask layer 4 a. Thus, the opening areas 4 c of the second masklayer 4 b are formed corresponding to the recesses of the firstselective layer 5 a.

After forming the second mask layer 4 b, it is cleaned with acetone andmethanol, immersed in diluted hydrochloric acid or diluted fluoric acidfor about 10 sec and cleaned with purified water.

Subsequently, a second selective growing layer 5 b is selectively grownin the lateral direction on the second mask layer 4 b like that thefirst selective layer 5 a. Thus, when conducting growing, for example,for 16 min, as shown in FIG. 3C, growing occurs preferentially in theregions above the opening areas 4 c of the second mask layer 4 b so asto fill the concaved recesses of the first selective layer 5 a, to forma second selective growing layer 5 b having a substantially planarsurface. That is, the surface is planarized even if the first selectivegrowing layer 5 a and the second selective growing layer 5 b are notgrown to large thickness.

In this case, since growing occurs laterally in the second selectivegrowing layer 5 b, in the regions situating above the mask areas 4 b ofthe second mask layer 4 b, the threading dislocations M in the firstselective growing layer 5 a continued from the underlying layer 3 by wayof the opening areas 4 c of the first mask layer 4 a are interrupted andno threading dislocations M are formed. Further, also in the regions ofthe second selective growing layer 5 b situated above the opening areas4 b of the second mask layer 4 b, since no threading dislocations M arepresent in the regions of the first selective growing layer 5 atherebelow, no threading dislocations M are formed. Namely, thethreading dislocations M are not formed for the entire surface in thesecond selective growing layer 5 a.

The growing time for the selective growing layer 5 b is preferablydefined so as to be sufficient for planarizing the surface. By the way,when the first selective growing layer 5 a and the second selectivegrowing layer 5 b are grown respectively under the conditions shownabove, the surface is substantially planarized when the thickness isabout 8 μm as a sum of the two layers.

After forming the second selective growing layer 5 b as described above,each of semiconductor layers, namely, an n side contact layer 6, an ntype cladding layer 7, a first guiding layer 8, an active layer 9, asecond active layer 10, a p type cladding layer 12 and a p side secondcontact layer 13 are grown respectively thereover, for example, by aMOCVD method. In this case, the temperature of the substrate 1 is set to800-1000° C. As starting material gases, are used trimethyl aluminum gas((CH₃)₃Al) for aluminum, trimethyl gallium gas for gallium, ammonia gasfor nitrogen, monosilane gas (SiH₄) for silicon, andbis=methylcyclopentadienyl magnesium gas (MeCP₂Mg) orbis=cyclopentadienyl magnesium gas (Cp₂Mg) for magnesium, respectivelyfor instance. Since no threading dislocations M are present in thesecond selective growing layer 5 b, no threading dislocations M areformed in each of the semiconductor layers.

After forming each of the semiconductor layers respectively, aninsulation film 14 comprising SiO₂ is formed on the p side contact layer13, for example, by a CVD method. Then, a resist film not illustrated iscoated on the insulation film 14 to form a mask pattern corresponding tothe position for forming the p side electrode 14 by photolithography.Subsequently, etching is conducted by using the pattern as a mask andthe insulation layer 14 is eliminated selectively to form an opening 14a corresponding to the position for forming the p side electrode 15.

Successively, nickel and gold, for instance, are evaporated successivelyfor instance on the entire surface (namely, on the p side contact layer13 from which the insulation layer 14 was eliminated selectively and onthe not illustrated resist film), and the not illustrated resist film iseliminated (lift off) together with nickel and gold vapor deposited onthe resist film, to form a p side electrode 15.

After forming the p side electrode 15, the insulation layer 14, the pside contact layer 13, the p type cladding layer 12, the second guidinglayer 11, the degradation preventive layer 10, the active layer 9, thefirst guiding layer 8 and the n type cladding layer 7 are successivelyremoved selectively corresponding to the position for forming the n sideelectrode 16. Subsequently, titanium, aluminum and gold are selectivelyvapor deposited successively on the n side contact layer 6 to form the nside electrode 16.

After forming the n side electrode 16, the substrate 1 is cleaved with apredetermined width in perpendicular to the longitudinal direction ofthe p side electrode 15 (longitudinal direction of a resonator), and areflection mirror layer is formed on the cleaved surface. Thus, a lightemitting semiconductor device shown in FIG. 1 is formed.

The device can also be fabricated if the formation of p-side electrodeis followed after the formation of n-side electrode.

Further, the light emitting semiconductor device can also bemanufactured as below. FIG. 4 illustrates a portion of steps in an othermanufacturing method.

In this manufacturing method, at first, a substrate 1 is provided and abuffer layer 2 and an underlying layer 3 are formed like that in theprevious manufacturing method. Then, after forming a first mask layer 4a on the underlying layer 3 like that in the previous manufacturingmethod, a plurality of mask areas 4 d and a plurality of opening areas 4c are formed respectively and cleaning is conducted.

Successively, on the first mask layer 4 a, a first selective layer 5 acomprising GaN is selectively grown in the lateral direction, forexample, by a MOCVD method. In this instance, the temperature of thesubstrate 1 is set to 1050° C., and ammonia and trimethyl gallium gasesare used as the starting material gas for instance. More specifically,while flowing an ammonia gas at a somewhat large flow rate, for example,of 10 liter/min, a trimethyl gallium gas is supplied so as to attain aglowing speed of about 4 μm/hr and they are reacted at a normalpressure.

Thus, when growing is conducted, for example, for 45 min, as illustratedin FIG. 4A, a substantially planar first selective growing layer 5 a isformed, being slightly bulged in the regions situated above the openingareas 4 c of the first mask layer 4 a of the first selective growinglayer 5 a. The threading dislocations M from the underlying layer 3 arecontinued and the threading dislocations M are formed like in themanufacturing method described previously. On the other hand, in theregions situated above the mask areas 4 d of the first selective growinglayer 5 a, threading dislocations M from the underlying layer 4 areinterrupted by the lateral growing and no threading dislocations areformed.

After forming the selective growing layer 5 a, as illustrated in FIG.4B, a second mask layer 4 b is formed, and a plurality of mask areas 4 aand a plurality of opening areas 4 c are formed respectively thereoverand cleaned in the same manner as in the manufacturing method describedpreviously.

Subsequently, a second selective growing layer 5 b is selectively grownin the lateral direction like that in the first selective growing layer5 a. Thus, when growing is conducted, for example, for one hour, asshown in FIG. 4C, a second selective growing layer 5 b having asubstantially planar surface is formed.

In this case, in the regions situated above the mask areas 4 b of thesecond mask layer 4 b, the threading dislocations M in the firstselective growing layer 5 a continued from the underlying layer 3 by wayof the opening areas 4 c of the first mask layer 4 a are interrupted andno threading dislocations M are formed. Further, also in the regionssituated above the opening areas 4 b of second selective growing layer 5b, since no threading dislocations M are present in the regions of thefirst selective growing layer 5 a therebelow, no threading dislocationsM are formed. Namely, the threading dislocations M are not formed forthe entire surface in the second selective growing layer 5 a.

By the way, when the first selective growing layer 5 a and the secondselective growing layer 5 b are grown respectively under the conditionsshown above, the surface is made substantially made planar with athickness of about 7 μm as a sum of the two layers in total.

After thus forming the second selective growing layer 5 b, semiconductorlayers, namely, an n side contact layer 6, an n type cladding layer 7, afirst guiding layer 8, an active layer 9, a second active layer 10, a ptype cladding layer 12 and a p side contact layer 13 are grownrespectively. Then, in the same manner as in the manufacturing methoddescribed previously, an insulation layer 14, a p side electrode 15 anda n side electrode 16 are formed and cleaved to a predetermined width toform reflection mirror layer. Thus, a light emitting semiconductordevice shown in FIG. 1 is formed.

The light emitting semiconductor device manufactured as described abovefunctions as below.

In the light emitting semiconductor device, when a predetermined voltageis applied between the n side electrode 16 and the p side electrode 15,current is injected to the active layer 9 to emit light by electron-holerecombination. In this embodiment, since the first mask layer 4 a andthe second mask layer 4 b, and the first selective growing layer 5 a andthe second selective growing layer 5 b are disposed alternately betweenthe substrate 1 and the semiconductor layers (n side contact layer 6, ntype cladding layer 7, first guiding layer 8, active layer 9,degradation preventive layer 10, second guiding layer 11, p typecladding layer 12 and p side contact layer 13), they interruptpropagation of the threading dislocations M in the laminating directionto lower the density of the threading dislocations M in thesemiconductor layer. Accordingly, less degradation is caused by theapplication of voltage and increase of the driving current during use issuppressed to extend the working life of the device.

As described above, in the light emitting semiconductor device accordingto this embodiment, since the first mask layer 4 a and the second masklayer 4 b, as well as the first selective growing layer 5 a and thesecond selective growing layer 5 b are disposed alternately, thethickness of the first selective growing layer 5 a and the secondselective growing layer 5 b can be reduced and the density of thethreading dislocations M can be lowered over the entire surface.Therefore, defects or warps due to the mismatching of lattice constantand thermal expansion coefficient relative to the substrate 1 made ofsapphire can be prevented to maintain the quality of the device, andincrease of the driving current during use can be suppressed to extendthe working life of the device.

Further, according to the light emitting semiconductor device, since theopening areas 4 c of the first mask layer 4 a are completely coveredwith the mask areas 4 d of the second mask layer 4 b in the laminatingdirection, propagation of the threading dislocations M from theunderlying layer 3 can be interrupted effectively.

Further, in the method of manufacturing the light emitting semiconductordevice according to this embodiment, since the first mask layer 4 a andthe second mask layer 4 b, as well as the first selective growing layer5 b and the second selective growing layer 5 b are laminated alternatelyand, subsequently, respective semiconductor layers (n side contact layer6, n type cladding layer 7, first guiding layer 8, active layer 9,second active layer 10, p type cladding layer 12 and p side contactlayer 13) are laminated respectively, the thickness of the firstselective growing layer 5 a and the second growing layer 5 b can bereduced and the density of the threading dislocations M can be loweredover the entire surface. Therefore, the growing time can be shortened toimprove the manufacturing efficiency, as well as the positions offorming light emitting regions are not restricted to increase the degreeof freedom in manufacture, so that the light emitting semiconductordevice according to the present invention can be manufactured easily.

In addition, when the second growing layer 5 b is formed by the methodidentical with that for the semiconductor layers to be laminated thereon(MOCVD method in this method), they can be grown continuously, toprevent intrusion of impurities and simplify the manufacturing steps.

FIG. 5 illustrates a light emitting semiconductor device according to asecond embodiment of the present invention. The second embodiment has aconstitution identical with that of the first embodiment excepting thata substrate 1 is constituted, for example, with n type single crystalgallium GaN with addition of silicon as an n type impurity, an n sideelectrode 16 is formed to the rear face of the substrate 1, a first masklayer 4 a is formed directly on the substrate 1, and an underlying layer21 is disposed between a second selective growing layer 5 b and an ntype cladding layer 7. Therefore, constituent elements, identical withthose of the first embodiment carry the same reference numerals forwhich detailed explanation will be omitted.

Namely, in the light emitting semiconductor device, the substrate 1 isconstituted with a conductive material, and the n side electrode 16 isformed on the rear face of the substrate 1. Further, the substrate 1 isconstituted with a group III nitride compound semiconductor identicalwith that for the semiconductor layer on which the substrate 1 is to beformed, so that the first mask layer 4 a and the first growing layer 5 acan be laminated directly on the substrate 1. Since conductivity isnecessary for the selective growing layer 5 different from the firstembodiment, it is constituted, for example, with an n type GaN withaddition of silicon as an n type impurity. Further, the underlying layer21 is constituted, for example, with an n type GaN with addition ofsilicon as an n type impurity.

The light emitting semiconductor device having the foregoingconstitution can be manufactured in the same manner as the firstembodiment, as well as operates in the same manner as the firstembodiment and has the identical effect with that of the firstembodiment.

The present invention has been explained with reference to each ofpreferred embodiments. However, the invention is not restricted to eachof the embodiments described above but various modifications arepossible. For example, in each of the embodiments described above,explanations have been made, referring to concrete examples tosemiconductors comprising the buffer layer 2, the underlying layers 3,21, the selective growing layer 5, the n side contact layer 6, the ntype cladding layer 7, the first guiding layer 8, the active layer 9,the degradation preventive layer 10, the second guiding layer 11, the ptype cladding layer 12 and the p side contact layer 13, respectively,but the present invention is applicable also to a case of constitutingeach of the layers by other appropriate semiconductors. However, thepresent invention is particularly effective in a case of constitutingeach of the layers with an appropriate group III nitride compoundsemiconductor (that is, a group III nitride compound semiconductorcontaining at least one group III element selected from the groupconsisting of gallium, aluminum, boron and indium, and nitrogen).

Further, in each of the embodiments described above, explanations havebeen made concretely to a case of having two mask layers (first masklayer 4 a and second mask layer 4 b) but a device comprising three ormore mask layers can be constituted in the same manner and manufacturedin the same way. In each of the embodiments described above, the openingareas 4 c of the first mask layer 4 a are completely covered with themask areas 4 d of the second mask 4 b as viewed in the laminatingdirection but it may also be covered completely by mask areas of aplurality of mask layers. Namely, it may suffice that positions forforming opening areas of at least one mask layer different from those ofat least one other mask layer, and the opening areas are completelycovered with mask areas of at least one other mask layer as viewed inthe laminating direction.

In each of the embodiments described above, strip-like opening areas 4 cand mask areas 4 d are disposed to the first mask layer 4 a and thesecond mask layer 4 b respectively, but the shape for the opening areas4 c and the mask areas 4 d may be optional and it may suffice that theopening areas of at least one mask layer are completely covered withmask areas of at least one other mask layer as viewed in the laminatingdirection.

In addition, in each of the embodiments described above, the first masklayer 4 a and the second mask layer 4 b are constituted with adielectric material, but they may be constituted with other materialsprovided that growing of the first selective growing layer 5 a and thesecond selective growing 5 b in the laminating direction can beinhibited.

Furthermore, in the first embodiment described above, the first masklayer 4 a and the first selective growing layer 5 a are formedrespectively on the underlying layer 3 but they may also be formedrespectively on the buffer layer.

In addition, in each of the embodiments described above, explanationshave been made to the light emitting semiconductor device in which theactive layer 9 is sandwiched between the first guiding layer 8 and thesecond guiding layer 22 and, further, they are sandwiched between the ntype cladding layer 7 and the p type cladding layer 12. However, thepresent invention is applicable also to a light emitting semiconductordevice having various structures, for example, a structure in which anactive layer is put between the cladding layers with no intervention ofthe guiding layers.

Further, in each of the embodiments described above, explanations havebeen made concretely with reference to a semiconductor laser as thesemiconductor light emitting device, but the present invention isapplicable also to other light emitting semiconductor devices such asLEDs.

Further, in each of the embodiments described above, explanations havebeen made only to the light emitting semiconductor device, but thepresent invention is applicable also to other semiconductor devices, forexample, FET (Field Effect Transistor).

Further, in each of the embodiments described above, explanations havebeen made to a case of growing the first selective growing layer 5 a andthe second selective growing layer 5 b by the MOCVD method or the halidevapor deposition method, but it may be grown also by other vapordeposition methods such as a molecular beam epitaxy (MBE) method.

Further, in each of the embodiments describe above, explanations havebeen made to a case of forming the buffer layer 2, the underlying layers3, 21, the n side contact layer 6, the n type cladding layer 7, thefirst guiding layer 8, the active layer 9, the degradation preventivelayer 10, the second guiding layer 11, the p type cladding layer 12 andthe p side contact layer 13, respectively, by the MOCVD method, but theymay be formed also by other vapor deposition methods such as a MBEmethod or a halide method.

Further, in each of the embodiments described above, explanations havebeen made to conditions upon growing the first selective growing layer 5a and the second selective growing layer 5 b with reference to concreteexamples, but they may be grown also under other various conditions. Forexample, also in a case of growing by the halide vapor depositionmethod, the second selective growing layer 5 b with a relatively planarsurface can be grown as shown in the second embodiment by adoptingconditions different from those for the first embodiment. Growing of thesecond selective growing layer 5 b having a relatively planar surface asdescribed above is preferred since the mask layers 4 a, 4 b can beeasily formed thereon.

As has been described above, according to the semiconductor device asdefined in any one of the features described above (corresponding toappended claims 1 to 10), since two or more of mask layers and selectivegrowing layers are provided alternately, the thickens of the selectivegrowing layers can be reduced and the density of the threadingdislocations can be lowered over the entire surface. Accordingly, thiscan provide an advantageous effect capable of preventing formation ofdefects or warps caused by mismatching of lattice constant and thermalexpansion coefficient relative to a substrate, for example, made ofsapphire to maintain the quality of the device, as well as capable ofimproving the quality of the device due to the lowering of the threadingdislocations.

Further, according to the method of manufacturing the semiconductordevice as defined in other features described above (corresponding toappended claims 11 to 21), since two or more mask layers and selectivegrowing layers are respectively laminated alternately and thensemiconductor layers are laminated, the thickness of the selectivegrowing layers can be reduced and the density of the threadingdislocations can be lowered over the entire surface. Accordingly, thiscan provide an advantageous effect capable of shortening the growingtime to improve the manufacturing efficiency and increasing the degreeof freedom in manufacture thereby easily manufacturing a semiconductordevice of the present invention.

Then, according to the light emitting semiconductor device in furtherfeatures as described above (corresponding to appended claims 22 to 31),since constitutions identical with those of the semiconductor deviceaccording to the present invention are provided, the thickness of theselective growing layers can be reduced and the density of the threadingdislocations can be lowered over the entire surface like that thesemiconductor device according to the present invention. Accordingly,this can provide an advantageous effect capable of preventing formationof defects or warps caused by mismatching of lattice constant andthermal expansion coefficient relative to the substrate, for example,made of sapphire to maintain the quality of the device, and suppressingincrease of the driving current during use to extend the working life ofthe device.

What is claimed is:
 1. A method of manufacturing a semiconductor devicewhich comprises: a step of laminating on a substrate a mask layer havingopening areas and a selective growing layer comprising a semiconductorwhich is grown selectively by way of a mask layer, the mask layer andthe selective growing layer being disposed each by two or more layersalternately and a step of laminating the mask layer and the selectivegrowing layer each by two or more layers and then laminatingsemiconductor layers thereon.
 2. A method of manufacturing asemiconductor device as defined in claim 1, wherein the methodcomprises, upon forming the mask layers, forming the opening areas in atleast one of a plurality of mask layers at positions different fromthose of at least one other layer, and covering the opening areasthereof completely by the mask areas of at least one other layer asviewed in the laminating direction.
 3. A method of manufacturing asemiconductor device as defined in claim 2, wherein the mask layercomprises silicon dioxide, silicon nitride or aluminum oxide.
 4. Amethod manufacturing a semiconductor device as defined in claim 2,wherein the semiconductor layer comprises a group III nitride compoundsemiconductor containing at least one element belonging to the group IIIof the periodical table and selected from the group consisting ofgallium (Ga), aluminum (Al), boron (B), indium (In) and nitrogen (N). 5.A method of manufacturing a semiconductor device as defined in claim 1,wherein the method comprises forming the mask layer with a dielectricmaterial.
 6. A method of manufacturing a semiconductor device as definedin claim 1, wherein the method comprises forming the mask layer withsilicon dioxide, silicon nitride or aluminum oxide.
 7. A method ofmanufacturing a semiconductor device as defined in claim 1, wherein themethod comprises forming the semiconductor layer with a group IIInitride compound semiconductor containing at least one element belongingto the group III of the periodical table and selected from the groupconsisting of gallium (Ga), aluminum (Al), boron (B), indium (In), andnitrogen (N).
 8. A method of manufacturing a semiconductor device asdefined in claim 7, wherein the method comprises forming the selectivegrowing layer with a group III nitride compound semiconductor containinggallium and nitrogen.
 9. A method of manufacturing a semiconductordevice as defined in claim 1, wherein the method comprises growing theselective growing layer by a vapor deposition method.
 10. A method ofmanufacturing a semiconductor device as defined in claim 1, whereinsapphire is used for the substrate.
 11. A method of manufacturing asemiconductor device as defined in claim 10, wherein the methodcomprises forming the mask layer by way of the buffer layer on thesubstrate.
 12. A method of manufacturing a semiconductor device asdefined in claim 10, wherein single crystals of gallium nitride are usedfor the substrate.
 13. A method of manufacturing a semiconductor deviceas defined in claim 12, wherein the method comprises forming the masklayers directly on the substrate.